| 摘要 |
PURPOSE:To obtain a nonswelling pattern profile high in resolution by exposing the resist composition of an alkali-soluble resin, a specified acid-photogenerating agent and a cross-linking agent and developing it with an alkaline water. CONSTITUTION:This photoresist composition contains the alkali-soluble resin, the acid-photogenerating agent, and the cross-linking agent in a weight proportion of 100:0.05 - 20:1 - 50. The alkali-soluble resin, preferably, has a phenolic hydroxyl group, and it can be embodied by a novolak resin, polyvinyl phenol, poly-N-(p-hydroxyphenyl)maleimide, poly-p-hydroxyphenyl(meth)acrylamide, etc. This negative type photosensitive undergoes process series of coating, exposure, heating, and development and is used for the photoresist. |
