摘要 |
<p>A process for forming a germanium-containing layer on a substrate having an oxygen-containing insulation layer on a surface thereof, said process comprising the steps of forming a protection layer on a surface of the oxygen-containing insulation layer, said protection layer preventing a decomposition of the oxygen-containing layer due to a reaction of oxygen in the oxygen-containing layer and a germanium-containing gas, and then forming the germanium-containing layer on the substrate by a chemical vapor deposition using the germanium-containing gas. <IMAGE></p> |