发明名称 Process for forming germanium-containing layer on oxygen-containing insulation layer.
摘要 <p>A process for forming a germanium-containing layer on a substrate having an oxygen-containing insulation layer on a surface thereof, said process comprising the steps of forming a protection layer on a surface of the oxygen-containing insulation layer, said protection layer preventing a decomposition of the oxygen-containing layer due to a reaction of oxygen in the oxygen-containing layer and a germanium-containing gas, and then forming the germanium-containing layer on the substrate by a chemical vapor deposition using the germanium-containing gas. <IMAGE></p>
申请公布号 EP0484056(A1) 申请公布日期 1992.05.06
申请号 EP19910309854 申请日期 1991.10.24
申请人 FUJITSU LIMITED 发明人 FUJIOKA, HIROSHI
分类号 H01L29/73;H01L21/20;H01L21/205;H01L21/331;H01L21/335;H01L29/165;H01L29/737 主分类号 H01L29/73
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