发明名称 |
Method for forming a pattern |
摘要 |
An ultraviolet light sensitive photoinitiator composition that includes at least one anthracene derivative represented by the formula: <IMAGE> wherein X is CH=CH2 or -(-CH2-)-nO-(-R) with R being H or <IMAGE> wherein each RI, RII and RIII individually is selected from the group of alkyl, alkenyl, aryl, <IMAGE> and <IMAGE> wherein each RIV, RV and RVI individually is selected from the group of alkyl, alkenyl and aryl; wherein m is an integer of 0 to 4, p is an integer of 0 to 4; and is n being 1 to 2; and onium salt; and an organic solvent. The composition is used for cationic polymerization of cationic polymerizable materials including in the formation of a pattern of a photoresist. Also certain novel epoxy-functionalized organosilicons are provided that are sensitive to radiation including E-beam radiation and exhibit resistance to oxygen reactive ion etching.
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申请公布号 |
US5110711(A) |
申请公布日期 |
1992.05.05 |
申请号 |
US19910683729 |
申请日期 |
1991.04.11 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
BABICH, EDWARD D.;GELORME, JEFFREY D.;HATZAKIS, MICHAEL;SHAW, JANE M.;STEWART, KEVIN J.;WITMAN, DAVID F. |
分类号 |
G03F7/027;G03F7/029;G03F7/075 |
主分类号 |
G03F7/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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