| 摘要 |
PURPOSE:To obtain a ceramic substrate having a low dielectric constant and a coefft. of thermal expansion close to that of a semiconductor device by calcin ing at a low temp. by mixing borosilicate glass powder with aluminum borosilicate powder in a specified ratio. CONSTITUTION:A starting material compsn. for a ceramic substrate is obtd. by mixing 40-80wt.% borosilicate glass powder of <=3mum average particle size consisting of, by weight, 65-85% SiO2, 5-25% B2O2, 0.1-7% one or more among Li2O, Na2O and K2O, 0.1-5% MgO and/or CaO and 0.1-5% AlO3 with 20-60wt.% aluminum borosilicate powder of <=3mum average particle size. The compsn. is mixed with water and/or an org. vehicle and molded into green sheets of a prescribed thickness and these sheets are laminated and calcined 90-1,000 deg.C to obtain a substrate. |
