| 摘要 |
1,262,513. Improvements in photo-resist adhesion. INTERNATIONAL BUSINESS MACHINES CORP. June 23, 1969 [July 2, 1968], No.31561/69. Heading G2C. A coating of photo-resist material is applied to an oxide surface with a hexa-alkyldisilazane containing adhesive. The surface may be a silicon oxide surface, and the hexa-alkyldisilazane may be hexamethyl- or hexaethyldisilazane. The photoresist material preferably contains polyvinyl annaniate, polyisoprene, natural rubber resin, formaldehyde novolak, cinnamylidene or polyacrylic ester, and may be a partially cyclized polymer of cis-1, 4-isoprene having an average molecular weight of 60 000 to 70 000 and an azide photoinitiator. The oxide surface may be precoated with the adhesive and the photo-resist material applied to the adhesive, or the adhesive may be admixed with the photo-resist material and the admixture applied to the oxide surface. The invention is described principally in terms of preparing semi-conductor devices, but has general applicability to any process which requires application of a photo-resist to an oxide surface. This invention prevents the tendency of the exposed and developed photo-resist coating to curl away from the substrate.
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