摘要 |
A vacuum device for covering objects with thin layers of metals, semiconductors and dielectrics consisting of two side chambers with two pairs of vacuum valve gates, opening and closing of which is synchronised with a fast motion mechanism and is done simultaneously in pairs, and a middle chamber at least three times longer than side chambers with a centrally located cathode and two independent mechanisms for shifting load-bearing plates powered by a driving unit. The chambers are vacuum connected, the device being equipped with two independent pumping systems. The middle segment is divided into three segments: a productive segment (3) and two positional segments (4, 5). The productive segment is equipped with a cathode (6) and a uniform motion mechanism (9) while the positional segments (4, 5) and the side segments (1, 2) are equipped with fast motion mutually synchronised mechanisms (10) and are topped with vacuum-tight covers (11). Besides, the segments (1, 2, 3, 4, 5) are all equal in length and equipped with inspection openings (12) and individual photoelectric sensors (15) situated on the plane (13) of travel of a feed tray (14). The sensors are connected to a control system, preferably a microcomputer controller.<IMAGE>
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