发明名称 RESIST DEVELOPING DEVICE AND METHOD THEREOF
摘要 PURPOSE:To drop the prescribed amounts of the developer and the washing solution with good control and intermittently with a short time of intervals by storing successively the specified liquid amount of a standing developer and a standing washing solution in a pipe path with a standing gas at a boundary, conveying those standing liquids successively and dropping them from a nozzle. CONSTITUTION:A rotary supporting base 2 is revolved while supporting a worked goods 1 covered with a resist film, and a nozzle 3 is disposed above the rotary supporting base 2 and one edge part of the pipe path 4 is connected with the nozzle 3. An agent distributor 8 is formed successively in the pipe of the pipe path 4 through the standing gas 71 consisting of a gas, the standing developer 51 consisting of the developer 5 and the standing washing solution 61 consisting of the washing solution. Besides the nozzle 3 drops the developer 5 and the washing solution 6 successively and intermittently on the worked goods 1. Hence the prescribed amounts of the developer 5 and the washing solution 6 are dropped in a short time of intervals with good control and intermittently.
申请公布号 JPH04128763(A) 申请公布日期 1992.04.30
申请号 JP19900249239 申请日期 1990.09.19
申请人 FUJITSU LTD 发明人 IZAWA TETSUO;KOBAYASHI KOICHI
分类号 G03F7/30;H01L21/027;H01L21/30 主分类号 G03F7/30
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