发明名称 METHOD OF ENGRAVING WITH IMAGE MASK AND PHOTOSENSITIVE LAMINATE FILM FOR SAID IMAGE MASK
摘要 <p>A photosensitive laminate film (10) comprising a support sheet (11), an image mask holding layer (12) strippably stuck to the support sheet and a water-soluble resin composition layer (13) disposed on the image mask holding layer (12), said layer (13) being crosslinkable by light. An engraving method which comprises the steps of (a) irradiating the laminate film (10) with patterning light to thereby form a crosslinked area corresponding to the pattern on the resin composition layer (13), (b) treating the resultant resin composition layer (13) with water to thereby dissolve away a noncrosslinked area and develop an image mask comprising the crosslinked area remaining on the image mask holding layer (12), (c) sticking to a material to be worked the photosensitive laminate film (10) having the image mask formed thereon, (d) stripping the support sheet (11) from the laminate film (10) and (e) engraving the image mask and then the material through the image mask. The above constitution makes it possible to create a fine, elaborate image on the surface of a material to be worked, such as glass, metal or plastic.</p>
申请公布号 WO1992007303(P1) 申请公布日期 1992.04.30
申请号 JP1990001360 申请日期 1990.10.22
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