发明名称 |
METHOD FOR THE RAPID DEPOSITION WITH LOW VAPOR PRESSURE REACTANTS BY CHEMICAL VAPOR DEPOSITION |
摘要 |
A method for applying coatings to substrates using chemical vapor deposition with low vapor pressure reagents is disclosed which comprises the steps of: (a) placing a substrate in a furnace means; (b) directly introducing powder reagents by a powder feeder means into said furnace means; and (c) vaporizing and reacting said reagents within said furnace means resulting in the deposition from the vapor phase of a coating on said substrate, wherein said coating can be an oxide superconductor.
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申请公布号 |
US5108983(A) |
申请公布日期 |
1992.04.28 |
申请号 |
US19890439843 |
申请日期 |
1989.11.21 |
申请人 |
GEORGIA TECH RESEARCH CORPORATION |
发明人 |
LACKEY, JR., WALTER J.;BAREFIELD, E. KENT;CARTER, WILLIAM B.;HANIGOFSKY, JOHN A.;HILL, DAVID N. |
分类号 |
C23C16/30;B05D7/24;C23C16/40;C23C16/44;C23C16/448;H01L39/24 |
主分类号 |
C23C16/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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