| 摘要 |
PURPOSE:To greatly improve the contrast of projected images and to improve the transfer accuracy of patterns by dividing the light generated from a light source to two beams of light and changing the optical path length until arriving at a mask, thereby putting the phases of two beams of the light into the antiphases from each other, then synthesizing the two beams of the light. CONSTITUTION:The light generated from the light source 2 is divided to two beams of the light L1,L2 and the optical path lengths until these beams arrive at the mask 14 are changed, by which the phases of the two beams of the light L1, L2 right after the passage through the different points of the mask 14 are made into the antiphases from each other; thereafter, the two beams of the light L1,L2 are synthesized and the surface of a sample 3 to be irradiated is irradiated with this light. The one light L1 transmitted through the prescribed transmission region on the mask 14 and another light L2 transmitted through another transmission region on the mask 14 weaken each other by interfering with each other in the boundary region at the points disposed in proximity on the sample 3 to be irradiated and, therefore, the contrast of the project ed images is greatly improved. |
