| 摘要 |
PURPOSE:To prevent the reduction in resolution in a facial direction by sputtering a sample with a primary ion beam, and by making the focal point of the primary ion beam identical with the surface of the sample, correspondent to the sputtering. CONSTITUTION:When a board 4 is lifted, the amount of receiving light by a pair of photodiodes 9, 11, is changed, and the amount of receiving light is fed-back to a calculation controller 13. The board 4 is thereby lifted until the amount of receiving light detected by a pair of photodiodes 9, 11 becomes identical, namely, until the sputtered surface of a semiconductor 5 becomes identical with a focal point of a primary ion beam I1. Even when the surface of the semiconductor 5 is sputtered, the position of the sputtered surface is controlled to be identical with the focal point of the primary ion beam I1. The reduction in resolution in the facial direction of a secondary ion beam I2 to be measured by a measurement part 7, is thus prevented. |
