| 摘要 |
PURPOSE:To reduce thermal deformation of the whole of a mask and deviation of pitches by forming a soft X-ray absorptive pattern on a composite silica film, and coating this pattern with a polymer film high in transmittance of soft X- rays and the visible light, such as polyimide. CONSTITUTION:A substrate 6 consists of a silicon nitride film 2; a composite silica film layer 3 formed by laminating on the film 2, one layer of silica film or plural layers produced by high frequency sputtering, and one layer of silica film layer or plural layers produced by CVD, alternately on each other; a transparent polymer film 5, such as polyimide, high in transmittance of soft X-rays and the visible light. A soft X-ray transferring mask consists of said substrate 6 and a soft X-ray absorptive pattern 4 formed between the film 3 and the film 5 and a supporting frame 7 made of quartz glass 7 formed on the support 6 on the side of the film 2. As a result, the obtained mask has not only proper tension, but also advantages of small dimensional change due to heat and high mechanical impact strength by virtue of the film 5, and it can reduce fog of an X-ray resist. |
