发明名称 POSITIVE TYPE PHOTORESIST COMPOSITION
摘要 PURPOSE:To obtain the photoresist compsn. having a particularly wide latitude while maintaining a high resolving power without losing the sensitivity by incorporating an alkaline-soluble novolak resin having a specific degree of dispersion, 1, 2-quinone diazide compd. and a low-molecular compd. having phenolic hydroxyl groups at specific weight % of the novolak resin into the above compsn. CONSTITUTION:This cmpsn. contains the alkaline-soluble novolak resin having 1.5 o 4.0 ratio of a weight average mol. wt. and number average mol. wt., the 1, 2-quinone diazide compd. and the low-molecular compd. having 12 to 50C in total in one molecule and 2 o 8 pieces of the phenolic hydroxyl group in one molecule at 2 to 30wt.% of the novolak resin. The mol. wt. of the novolak resin refers to the value which is defined with a standard polystyrene as a reference value and is obtd. by gel permeation chromatography.
申请公布号 JPH04122938(A) 申请公布日期 1992.04.23
申请号 JP19900242973 申请日期 1990.09.13
申请人 FUJI PHOTO FILM CO LTD 发明人 SAKAGUCHI SHINJI;KOKUBO TADAYOSHI;TAN SHIRO
分类号 G03F7/004;G03F7/022;G03F7/023;H01L21/027;H01L21/30 主分类号 G03F7/004
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