发明名称 CLAMP DEVICE OF WAFER AND LAMP METHOD
摘要 <p>PURPOSE:To make heat transmission conditions fixed by changing a contact pressure between a wafer and a fixing base in accordance with a pressure difference between an atmospheric pressure of an inside of a bellows and that of an outside thereof. CONSTITUTION:A movable board 4 and a clamp ring 2 are connected to both ends of a rod 3 which passes through a fixing base 1 which is provided with a temperature controlling medium flow path 1a. A bellows 5 is interposed between the base 1 and board 4, and the ring 2 brings a wafer 6 into contact with the fixing base 1 by pressure difference between an atmospheric pressure of an inside of the bellows 5 and that of a periphery thereof. When an atmospheric pressure outside the bellows 5 lowers and vacuum degree increases, a contact pressure between the wafer 6 and the base 1 increases, thereby reducing the contact pressure in accordance with lowering of vacuum degree. Therefore, the higher vacuum degree is, the more effectively it compensates for lowering of heat transmission between the wafer 6 and the base 1. It is therefore possible to correct change of heat transmission in accordance with vacuum degree if conditions are adjusted.</p>
申请公布号 JPH04122045(A) 申请公布日期 1992.04.22
申请号 JP19900243514 申请日期 1990.09.12
申请人 FUJITSU LTD 发明人 KADOU FUTOSHI
分类号 H01L21/683;H01L21/68 主分类号 H01L21/683
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