| 摘要 |
<p>The machine comprises a deposition chamber, a plasma being able to be created in the chamber by an electronic cyclotron resonance mechanism induced by assemblies located on either side of the cathode (14), each assembly comprising a wire applicator (11) and a bar magnet (12), a central bar magnet (15) being disposed between the two assemblies. Loop-round bar magnets (16), together with the bar magnets (12) of the said assemblies, flank the cathode, these flanking bar magnets having an inverse polarity to that of the central bar magnet. <IMAGE></p> |
