| 摘要 |
PURPOSE:To elevate the protectiveness of an X-ray absorber pattern and prevent the dislocation, the exfoliation, and the damage of the X-ray absorber pattern by arranging the constitution such that one part of the X-ray absorber pattern is buried in an X-ray transmitting film. CONSTITUTION:An X-ray mask structure for lithography comprises the patterns of an X-ray transmitting film 2, which is made on the silicon wafer 1 being the mask supporting frame, and an X-ray absorber 4, whose one part is buried in the film 2. By this construction, the adhesion of the X-ray absorber increases, and the protectiveness is enhanced, and the occurrence of the dislocation, the exfoliation, and the damage of the X-ray absorber can be prevented. |
