| 摘要 |
<p>PURPOSE:To enable the highly accurate transfer of the superfine pattern on the submicron level by making an X-ray transmitting film out of a specified hard carbon film to use it as a mask for X-ray exposure. CONSTITUTION:By heat-treating the amorphous carbon film such as a diamond carbon film, which contains several tens of atomic % hydrogen in film formation and has the internal stress of compression, an a-C:H film, etc., it becomes the hard carbon film, wherein the hydrogen inside the film is excluded and also the internal stress in the direction of compression is changed into the internal stress in the tensile direction, and using this for an X-ray transmitting film, an X-ray exposure film is made. By the film, wherein the internal stress is removed and the transformation and deterioration do not occur even during the irradiation with a high energy X-ray due to absence of hydrogen, the highly- precise transfer of the superfine pattern on the submicron level can be done.</p> |
