PROCESS FOR FORMING MULTI-LEVEL COPLANAR CONDUCTOR/INSULATOR FILMS EMPLOYING PHOTOSENSITIVE POLYIMIDE POLYMER COMPOSITIONS

摘要

Disclosed is a process for producing multi-level conductor/insulator films on a processed semiconductor substrate (2) having a conductor pattern (4). The insulator layers (1, 6), each comprise a photosensitive polyimide polymer composition, and this allows the desired wiring channels and stud vias to be formed directly in the insulator layers, without the use of separate masking layers and resulting image transfer steps, thus providing a less cumbersome and costly process.