发明名称 Exposure control system
摘要 An exposure control system includes a pulsed light source; a photoelectric converting device for receiving a portion of pulsed light from the pulsed light source and for producing a photoelectric signal; an integration gate producing device for producing an integration gate signal after a predetermined specified time from the production of an emission synchronization signal related to the pulsed light source, wherein the specified time is set to be not greater than a delay time from the production of the emission synchronization signal to the start of actual emission of the pulsed light source; and integrating device for integrating the photoelectric signal from the photoelectric converting device during a time period in which the integration gate producing device produces the integration gate signal; and a control device for integrating a resultant of the integration by the integrating device each time one pulse light is emitted, the control device discriminating whether the result of integration is less than a predetermined or not, each time one pulse light is emitted, and the control device stopping the emission of the pulsed light when the result of integration becomes not less than the predetermined.
申请公布号 US5107275(A) 申请公布日期 1992.04.21
申请号 US19900611442 申请日期 1990.11.13
申请人 CANON KABUSHIKI KAISHA 发明人 TSURUOKA, YUJI;YUI, YOSHIKIYO
分类号 G03F7/20;H01L21/30;H04N1/036 主分类号 G03F7/20
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