| 摘要 |
PURPOSE:To keep the incident light of synchrotron radiation light always constant to enlarge the exposure region so as to obtain high exposure-uniformity over the whole of a wide exposure region by providing a blazed grating mirror which reflects synchrotron radiation light and a driving device which oscillates the blazed grating mirror forward and backward. CONSTITUTION:This X-ray exposure apparatus has a blazed grating mirror 4 which reflects synchrotron radiation light 3 radiated from a synchrotron radiation light source 2 of an electron accumulation ring 1 and an oscillation motor 5 which oscillates the blazed grating mirror 4 forward and backward. When the incidence angle of the synchrotron radiation light 3 to the blazed grating mirror 4 is theta1 and the blazed angle of the blazed mirror 4 is theta2, the upward and downward width of the synchrotron radiation light 3 is enlarged. Thus, uniformity in exposure is improved by forward and backward oscillation of the blazed grating mirror 4. In addition, the incident light of the synchrotron radiation light 3 to the blazed grating mirror 4 is always constant; therefore, its reflectance is constant. |
