Thin coatings for use in semiconductor integrated circuits and processes as antireflection coatings consisting of tungsten silicide

摘要

An antireflection coating (21) for use in integrated circuit processing consists of a film of tungsten silicide (WSi0.45) or tungsten silicon nitride (WSiN). These coatings are preferably made by sputtering, with the tungsten silicon nitride coating being made by sputtering in a nitrogen-containing atmosphere.