PATTERN FORMING METHOD

摘要

PURPOSE:To form patterns exclusive of closed loop-shaped patterns by using a shifter which converts the phase of exposing light to the phase varying by 180 deg. therefrom. CONSTITUTION:The phases of the exposing light transmitted through 1 at the section 11A-12A and the exposing light transmitted through 2 vary by 180 deg. when the exposing light is made incident on the mask. The respective diffracted light rays overlap on and negate each other at the boundary thereof and the light intensity decreases to 0. On the other hand, the difference in the phases at the respective boundaries does not attain 180 deg. at the section 11B-12B and the light intensity does not decrease to 0. The patterns enclosed by bald lines are formed on a substrate when a photoresist to be resolved at the light intensity of >=30% of the incident light is used. The shifter to convert the phase of the exposing light to the phase varying by 180 deg. therefrom is provided in at least a part of the circumference of the shifter to convert the phase of the exposing light by 180 deg., by which the two independent fine line patterns are formed.