发明名称 Method of forming bipolar transistor with integral base emitter load resistor
摘要 The described embodiments of the present invention provide a bipolar transistor using an integrated field effect load device with one end of the load device integrally formed with the base of the transistor. The gate of the load device is connected to the emitter of the transistor. This structure is particularly advantageous in bipolar-complementary metal oxide semiconductor (BiCMOS) integrated circuitry. The unconnected end of the load device may be connected to the emitter using standard metal interconnection techniques or local interconnection techniques. In an additional embodiment of the invention, the end of the load device not connected to the base may be left unisolated to the substrate and thus connected to ground. It often occurs that the emitter of the bipolar transistor will be connected to ground and thus an automatic connection of the load device between the base and the emitter can be realized. In addition, by removing the isolation, the integrated circuit area required for the isolation may be saved.
申请公布号 US5104817(A) 申请公布日期 1992.04.14
申请号 US19900496486 申请日期 1990.03.20
申请人 TEXAS INSTRUMENTS INCORPORATED 发明人 SCOTT, DAVID B.
分类号 H01L21/761;H01L21/8248;H01L21/8249 主分类号 H01L21/761
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