发明名称 MASK FOR X-RAY EXPOSURE
摘要 PURPOSE:To lengthen the life of an X-ray mask and reduce the cost accompanying that by arranging a mask pattern consisting of an X-ray absorber on the inorganic material film on one side of an X-ray transmitting film. CONSTITUTION:An X-ray transmitting film of three-layer structure, where both sides of the Be film 3 which becomes the nucleus of an X-ray transmitting film (membrane) are covered with firs and second SiC films 2 and 4, is bonded onto the mask supporting frame 5 consisting of SiC, or the like through the Si substrate 1 being the base substance. And mask patterns 7A and 7B being X-ray absorbers and consisting of, for example, tantalum (Ta) films 7 are arranged on the second SiC films 4 on the top side of the X-ray transmitting film.
申请公布号 JPH04107912(A) 申请公布日期 1992.04.09
申请号 JP19900227129 申请日期 1990.08.29
申请人 FUJITSU LTD 发明人 KITAMURA YOSHITAKA;SUGISHIMA KENJI
分类号 G03F1/22;H01L21/027 主分类号 G03F1/22
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