| 摘要 |
PURPOSE:To do the transferring work such as X-ray exposure, etc., efficiently at high speed by compulsorily exhausting the gap between both so as to evacuate it when bringing an X-ray mask and a substrate close to each other, and supplying gas compulsorily from outside into the gap between both when separating the X-ray mask and the substrate so as to pressurize it. CONSTITUTION:At the point of time before bringing an X-ray mask 1 and a substrate 5 close to each other, the exhaust operation of the gap G is started to reduce the pressure in the gap G, and on bringing them close to each other, the access is completed, and the exposure by the X-ray mask 1 is performed. Then, when separating the X-ray mask 1 form the substrate 5, the intake operation to the gap G is started, and they are separated when the gap G begins to be pressurized, and the separation finishes. When is more, a resistance generation part 7 for generating the flow resistance of the gas is made on the side outer than a supply-exhaust port 6, and the interval between the resistance generation part 7 and the substrate 5 is made so that d<=D, to the interval between the X-ray mask 1 and the substrate 5. |
