发明名称 PRODUCTION OF SURFACE-COATED SILICON NITRIDE BASED CERAMICS
摘要 PURPOSE:To form unevenness on the surface of a substrate and improve release resistance of a coated layer by dipping a ceramic substrate surface in 10wt.% aqueous solution of acid and treating surface thereof before forming a rigid coating layer on the surface of ceramic substrate. CONSTITUTION:A rigid coating layer is formed on the surface of a substrate consisting of silicon nitride based ceramics. The above-mentioned ceramics contain silicon nitride as a main ingredient and contain 0.1-10wt.% compound selected from Al2O3, Y2O3, MgO, AlN, HFO2, etc. The above-mentioned rigid coating layer consists of either one among carbide, nitride, carbon nitride and oxide of a metal selected from metal of the groups IVa, Va and VIa of periodic table and Al. The substrate surface is dipped in >=10wt.% aqueous solution of acid prior to formation of the above-mentioned rigid coating layer to treat surface thereof.
申请公布号 JPH04104982(A) 申请公布日期 1992.04.07
申请号 JP19900217302 申请日期 1990.08.17
申请人 SUMITOMO ELECTRIC IND LTD;SUMITOMO DENKOU IGETAROI KK 发明人 NAKAMATA TOSHIAKI;NOMURA TOSHIO;MORIGUCHI HIDEKI;OMORI NAOYA;KINOSHITA TAKASHI
分类号 C04B35/584;C04B35/58;C04B41/87;C04B41/89 主分类号 C04B35/584
代理机构 代理人
主权项
地址