| 摘要 |
<p>PURPOSE:To make a picture element small without increasing patterning accuracy by making a picture element electrode and a nonlinear resistance film contact each other at a pat of their overlapping part and interposing an insulating film at the remaining part. CONSTITUTION:A transparent electrode and an insulating film are formed on a glass substrate 1 and after resist coating, exposure, and development, the insulating film and transparent electrode are etched to form a picture element electrode pattern. Then the insulating film is etched again before resist separation to form an insulating film 4 in a small shape of about 1mum on the picture element electrode. Then the nonlinear resistance film 6 and a metallic film are formed to form the two-terminal element and driving electrode 3. Consequently, the area of the two-terminal element is based on the line width of the driving electrode and the side etching width (about 1mum) of the insulating film and made small without improving the patterning accuracy.</p> |
