发明名称 PELLICLE FOR LITHOGRAPHY
摘要 <p>PURPOSE:To prevent deterioration of transparency with the lapse of time by using a copolymer of tetrafluoroethylene and a specified F-containing monomer. CONSTITUTION:The copolymer of the tetrafluoroethylene and the monomer having a cyclic perfluoroether group is dissolved in an F-containing solvent to form 3 - 10% concentration, and a film is formed by a solution casting method using this solution by a spin coater, a knife coater, or the like. It is preferred to form a film thickness of 0.5 - 10mum, especially, 0.8 - 5mum, thus permitting an exposure time to be reduced, and the pellicle film strength to be enhanced by thickening the film.</p>
申请公布号 JPH04104155(A) 申请公布日期 1992.04.06
申请号 JP19900222167 申请日期 1990.08.23
申请人 SHIN ETSU CHEM CO LTD 发明人 KUBOTA YOSHIHIRO;KASHIDA SHU;NAGATA AKIHIKO;NOGUCHI HITOSHI
分类号 G03F1/62;H01L21/027 主分类号 G03F1/62
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