发明名称 METHOD FOR MEASURING TRANSMISSIVITY OF PHOTOMASK AND PELLICLE
摘要 <p>PURPOSE:To easily measure the transmissivity of a pellicle after the pellicle is attached to the photomask, which is very hard, by providing a hole at least at one spot in a part covered with the pellicle and out of the exposing area of the photomask on the photomask to which the pellicle is attached. CONSTITUTION:After a luminous flux which is converged to about 10mumphi is nearly vertically made incident and transmitted through the pellicle 23 by using a light beam which is used for exposure as a light source for measuring the transmissivity of the pellicle 23, it is transmitted through the hole 27 for measuring the transmissivity of the pellicle 23 and further transmitted through the pellicle 23 on a lower side, then it is made incident on a photomultiplier 26 for measuring the transmissivity of the pellicle 23. The light intensity of the luminous flux 25 is measured by the photomultiplier 26 so as to calculate the transmissivity of the pellicle 23. Then, the incident angle of the luminous flux 25 is changed so that the luminous flux 25 is made incident to be transmitted through the pellicle 23 above the exposing area 24. After the luminous flux 25 is transmitted through the hole 27 for measuring the transmissivity next and allowed to pass through the pellicle 23 on the lower side, it is made incident on the photomultiplier 26 for measuring the transmissivity.</p>
申请公布号 JPH04100047(A) 申请公布日期 1992.04.02
申请号 JP19900218411 申请日期 1990.08.20
申请人 SEIKO EPSON CORP 发明人 OGOSHI TAKESHI
分类号 G01N21/59;G03F1/44;G03F1/50;H01L21/027 主分类号 G01N21/59
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