发明名称 SAETT OCH ANORDNING FOER GASBEHANDLING AV VAETSKOR
摘要 Fluid is conducted away from the zone under the gas input device to be resprayed via a pump into the fluid area above the gas input device in order to produce powerful stirring and dispersing. In the equipment is a gas input device arranged slightly above the bottom of the fluid container, one or more inlets for a pump beneath the gas input device and one or more nozzles issuing in the container above the gas input device and connected to the pump outlet. - The gas input device which emits gas in the form of fine bubbles is formed as a horizontal plate which covers a large part of the container complete area. The nozzles are fitted in the wall of the container and are directed inclinedly downwards towards the centre of the container. They are also located above the fluid surface. The pump is of the immersible type fitted adjacent to the bottom of the container.
申请公布号 SE9201012(D0) 申请公布日期 1992.04.01
申请号 SE19920001012 申请日期 1992.04.01
申请人 ITT FLYGT AB 发明人 H *KARLSEN
分类号 B01F3/04 主分类号 B01F3/04
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