发明名称 |
A method of enhancing the properties of a thin film on a substrate. |
摘要 |
<p>Properties of a thin film of vacuum deposited material, such as titanium nitride, on a substrate are enhanced by plasma or thermal annealing of the thin film without removing the film from a vacuum environment. The annealing step may be performed in the same vacuum chamber as the sputter deposition, or in a different vacuum chamber, provided the substrate can be transferred between chambers while remaining in a vacuum environment. <IMAGE></p> |
申请公布号 |
EP0477990(A2) |
申请公布日期 |
1992.04.01 |
申请号 |
EP19910116701 |
申请日期 |
1991.09.30 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
GILBOA, HAIM;MOSELY, RODERICK C. |
分类号 |
H01L21/203;C23C14/06;C23C14/58;H01L21/28;H01L21/318;H01L21/3205;H01L23/52 |
主分类号 |
H01L21/203 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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