| 摘要 |
PURPOSE:To obtain a coating film with high sensitivity to the exposure of ultraviolet rays and with less tackiness and to be excellent in the development property in an alkaline aqueous solution by reacting the polyglycidyl amine compound obtained from a poly(aminophenyl)methane derivative, an unsaturated monocarboxylic acid, and a polybasic acid anhydride successively. CONSTITUTION:This composition incorporates the photopolymerized compound obtained from reacting successively the poly(aminophenyl)methane compound obtained from the poly(aminopheny)methane derivative, the unsaturated monocarboxylic acid and the polybasic acid anhydride, and a photoradical polymerization initiator. Hence the coating film with high sensitivity to exposure to ultraviolet rays and with less tackiness is obtained and is excellent in the development property in an alkaline aqueous solution and also the hardened film is excellent in the heat resistance, the adhesiveness to the supporting base and the electrical characteristic. It is most suitable for the protective films for a colored filter layer and electronic devices and the permanent protective masks for the solder resist, etc., for manufacturing printed circuit boards, etc. |
