| 摘要 |
PURPOSE:To remove the partial blurring of a projected image and to accomplish exposure with high accuracy by providing a photomask holding angle adjusting mechanism or a projecting lens holding angle adjusting mechanism which can change the solid angle of a photomask or a projecting lens viewed from a point on an optical axis on a projection plane. CONSTITUTION:The photomask, holding angle adjusting mechanism is constituted of a supporting plate 31 whose center part is squarely holed, three supporting screws 34a-34c as a supporting pin, and a substrate 33 for supporting the three supporting screws. The photomask is arranged on the upper surface of the supporting plate 31 through a horizontal direction position adjusting mechanism and a rotating position adjusting mechanism. Then, the screw 34a is fixed on the substrate 33 and the screws 34b and 34c are screwed on the substrate 33 so that they can displace in an optical axis direction X. Therefore, the holding angle of the photomask arranged on the upper surface of the supporting plate 31 is adjusted by turning the screw 34b(34c), and the solid angle theta is changed. Thus, the partial blurring of the image is removed and pattern exposure with high accuracy is accomplished. |
