发明名称 PREPARATION OF MASK FOR ENGRAVING AND MATERIAL THEREFOR
摘要 <p>PURPOSE:To form a mask image automatically and easily by specifying the transmission density of an ink layer, the average roughness at the center of the back of a base in relation to that of the ink layer, and the surface resistivity of one side of the back in relation to the ink layer of a base material or the resistivities of both the sides of the back. CONSTITUTION:Mask-image information, inputted from an image input part 3 and compiled in an image processing part 1, is outputted to a thermal transfer system 6 by a print controller 5. The system 6 consists of the termal transfer head 60, a thermal transfer ribbon 61 which composes an ink-layer transfer material and a transparent image-receiving body 62 which composes an ink-layer receiving material. The mask image is formed by thermally transferring the ribbon 61 to the image receiving body 62 by the head 60. The mask for engraving is formed on the image receiving body 62. The mask material whose transmission density of the ink layer is >=2 against the light having 500nm or less wavelength and <=2 against a part of 500nm or more wavelength is used the average roughness at the center of the back of the base is 0.1-2.0mum in relation to that of the ink layer. The surface resistivity of an ink-layer surface or the back of the mask base material is 10<12>OMEGA or less at 25 deg.C and 25% R.</p>
申请公布号 JPH0498258(A) 申请公布日期 1992.03.30
申请号 JP19900216637 申请日期 1990.08.17
申请人 KONICA CORP 发明人 KAWAKAMI SOTA;HOSOI YOSHIYUKI
分类号 G03F1/00;G03F1/92 主分类号 G03F1/00
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