| 摘要 |
PURPOSE:To allow production by the simple production process by incorporating an acrylonitrile deriv. polymer as a light shielding material into the photomask. CONSTITUTION:This photomask is constituted by contg. the acrylonitrile deriv. polymer as the light shielding material. Namely, the acrylonitrile deriv. polymer has photosensitivity in high-energy radiations, such as electron beams. Then, the polymer itself has the function similar to the function of a photoresist. The absorbance to UV rays and far UV rays increases greatly when the polymer is heated. The photomask and reticule which can be produced by the simple production process are obtd. in this way and contribution is made to the rationalization of apparatus for producing semiconductors. |
