发明名称 RESIST REMOVING APPARATUS
摘要 PURPOSE:To ensure good peelability, cleanliness, and evenness for a large size substrate by installing ozone jetting pipes having a plurality of blowholes for jetting ozone in the direction perpendicular to the substrate conveying direction and in the direction horizontal to the substrate surface. CONSTITUTION:After ozone is supplied from ozone jetting pipe laid in parallel to a conveyor belt 1 in the direction perpendicular to the conveying direction and in the direction parallel to the surface of a substrate 4, ozone is exhausted through both the exhaust chambers 11 and exhaust pipes 10 installed on the opposite side of belt 1 from pipes 9. Further, at the center of the apparatus, ozone pipe 9 and chamber 11 at the left-hand side of the apparatus are installed opposite to those at the right side thereof from the belt. Furthermore, while a substrate 4 is mounted on a conveyor belt 1 and moved in the horizontal direction, by means of a halogen lamp 5, low pressure mercury lamp 6, and ozone jetting pipes 9 infrared and ultraviolet rays are projected and ozone is jetted to the substrate 4, respectively. With this, the resist on a large area substrate can be removed at low temperature and evenly without contaminating the surface of the substrate.
申请公布号 JPH0497515(A) 申请公布日期 1992.03.30
申请号 JP19900215557 申请日期 1990.08.15
申请人 NEC CORP 发明人 KIMURA MASAKAZU
分类号 G03F7/42;H01L21/027;H01L21/30 主分类号 G03F7/42
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