发明名称 HALBLEITER MIT MEHRSCHICHTIGER METALLISIERUNG UND VERFAHREN ZU DESSEN HERSTELLUNG
摘要 There are provided a semiconductor device having alternately layered insulating and conductive layers on the major surface of a semiconductor body and the process for manufacturing the semiconductor device. In the manufacturing process, the conductive layers other than the conductive layer finally formed are each formed to be a laminate including at least two metal layers of which the etching rates are different. The photo-engraving process follows this step. In the lamina, the metal layer closer to the semiconductor body has a lower etching rate than that of the metal layer formed thereover. In the semiconductor device, the conductive layer other than that disposed furthest away from the semiconductor body has its side wall diverged to widen toward the semiconductor body.
申请公布号 DE2740757(A1) 申请公布日期 1978.03.16
申请号 DE19772740757 申请日期 1977.09.09
申请人 TOKYO SHIBAURA ELECTRIC CO.,LTD. 发明人 AOYAMA,MASAHARU;HIRAKI,SHUNICHI;YONEZAWA,TOSHIO
分类号 H01L21/3205;H01L21/306;H01L21/3213;H01L21/768;(IPC1-7):H01L21/88 主分类号 H01L21/3205
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