| 摘要 |
PURPOSE:To make it possible to form or test a pattern with high accuracy by exposing or testing the pattern after it is detected that a semiconductor substrate or a glass mask was heated to a certain temperature or temperature distribution. CONSTITUTION:A sample chamber 1 is equipped with a stocker 7 to stock a glass mask or a semiconductor wafer 4. An image is drawn to form a high- accuracy pattern after a measurement thermo-couple 8 is brought into contact with the glass mask, the semiconductor wafer, or a sample holder 4 under treatment by a robot arm 9 and the temperature thereof and the difference in temperature therebetween reach a certain level. A sample chamber 10 is equipped with a stocker 15 to stock treated glass masks 13 mounted on sample holders 12 and the temperatures thereof or the difference in temperature therebetween is measured with thermo-couples 17 fixed to robot arms 16. When the result of the measurement reaches a certain level, the treated glass masks 13 on the sample holders 12 in the stocker are selectively sent to a stage 11 for the specified pattern inspection. |
