发明名称
摘要 <p>PURPOSE:To improve dyeing resistance and the adhesion to a substrate or a dyeing layer by using poly(meth)acrylic acid having a specific amt. of a residual carboxylic group or the deriv. thereof as a dyeing-resistant insulation layer. CONSTITUTION:A mixture of a water soluble polymer and dischromate is coated on a substrate to form a layer to be dyed. The layer to be dyed is exposed through a prescribed pattern mask and is developed with water to form the part of the layer to be dyed, and said part is dyed with a dye having a prescribed spectral characteristic. A dyeing-resistant insulation layer using a polymer having the unit expressed by the general formulas I , II is coated thereon. In the formulas, R' denotes alkyl, R<2>, R<3> denote hydrogen and a methyl group. The polymer of which the unit expressed by the formula I is 80-40mol%, more preferably 70-50mol%, and the unit expressed by the formula II is 20-60mol%, more preferably 30-50mol% is used.</p>
申请公布号 JPH0418281(B2) 申请公布日期 1992.03.27
申请号 JP19820160638 申请日期 1982.09.14
申请人 MITSUBISHI CHEM IND 发明人 MIURA KONOE;OCHIAI TAMEICHI;MAKISHIMA HIDEO
分类号 G02B5/20;G02B5/22 主分类号 G02B5/20
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