发明名称 POSITIVE PHOTORESIST COMPOSITION
摘要 PURPOSE:To obtain the effective photoresist by using a resin introduced with the group expressed by specific formula in a part of the double bond part of a high-polymer compd. (A) having prescribed carbon-carbon double bonds and a compd. contg. a quinonediazide unit as constituting components. CONSTITUTION:The high-polymer compd. (A) has 300 to 30,000mol.wt., 50 to 500 iodine value and the carbon-carbon double bonds. The group can be introduced into at least a part of the double bond parts is expressed is expressed by formula, where R<1> denotes a hydrogen atom, halogen atom or 1 to 3C alkyl group; R<2> denotes 1 to 10C alkyl group, cycloalkyl group, aryl group. This compsn. is formed by using 2, 3, 4-trihydroxybenzophenone, etc., and the compounding ratio of this component is specified to 25 to 100pts.wt. per 100pts. wt. component A. The compsn. is neutralized by an org. amine and is dispersed or dissolved in water.
申请公布号 JPH0496067(A) 申请公布日期 1992.03.27
申请号 JP19900213731 申请日期 1990.08.14
申请人 NIPPON OIL CO LTD 发明人 YODA EIJI;SATO HARUYOSHI;YAMASHITA YUKIO;YUASA HITOSHI;OTSUKI YUTAKA
分类号 C08F8/46;G03F7/023;H01L21/027;H01L21/30;H05K3/00;H05K3/06 主分类号 C08F8/46
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