| 摘要 |
<p>PURPOSE:To eliminate the drop-outs at the ends of patterns by a washing stage by providing a transparent film on a photomask formed with patterns consisting of a metallic film or metal oxide film on a transparent substrate. CONSTITUTION:The metallic film (or metallic oxide film) consisting of Cr, etc., is formed at 500 to 3,000Angstrom thickness on the glass substrate 11 and is patterned to form patterns 13 for light shielding. The surface of the glass substrate formed with the patterns 13 is washed and thereafter, a fluorine polymer soln. is applied by a spin coating method on the surface to form a thin transparent film 14. The thin transparent film 14 is formed on the rear surface of the glass substrate 11 as well. The clean pattern surface is obtd. by peeling the thin transparent film 14 after the use of the photomask and, therefore, the need for a washing stage is eliminated. The thin transparent film is again used on the surface of the pattern 13 in the case of reuse.</p> |
