| 摘要 |
PURPOSE:To vary the levels of an attraction surface and the level of an exposing sample and exposing mask and to avert the sticking of dust by setting the smaller one between a 1st distance and a 3rd distance larger than the larger on between a 2nd distance and a 4th distance when the distance from the 3A-th face to the 3B-th face is designated as the 4th distance. CONSTITUTION:The safe distance [(the smaller one of L1 and L3) - (the larger one of L2 and L4)] corresponding to the difference between the smaller one of the 1st distance (L1) and the 3rd distance (L3) and the larger one of the 2nd distance (L2) and the 4th distance (L4) is kept between the exposing surface 26a of the exposing sample 26 and 1st surface 29 when a 2nd stage 27 and a 3rd stage 30 are in an integral relation. The damage of the exposing sample 26 arising from the relative movement of the 3rd stage 30 and the 1st stage 20 is averted in this way and the sticking of the dust is averted by varying the level of the attraction surface and the level of the exposing sample 26 and the exposing mask 25. |
