发明名称 PRODUCTION OF SUBSTRATE FOR ACTIVE MATRIX
摘要 <p>PURPOSE:To decrease the number of masks and to improve the cost and yield by commonly using the mask to be used at the time of forming thin-film two- terminal elements in two stages. CONSTITUTION:Respective picture element electrodes 4 are formed on a substrate 1 and 1st conductors 7 are formed and patterned on the picture element electrodes 4. A hard carbon film 2 is deposited thereon. This film is coated thereon with a conductor thin film for bus lines by a method, such as vapor deposition or sputtering, and is patterned to prescribed patterns to form 2nd conductors 6 to constitute the bus lines. Resist patterns 10 are formed in order to pattern the hard carbon film 2. The resist patterns 10 are formed as they are for removal of the unnecessary parts of the 1st conductors 7 as well, by which the number of the masks is decreased. The cost and yield are improved in this way.</p>
申请公布号 JPH0493819(A) 申请公布日期 1992.03.26
申请号 JP19900206480 申请日期 1990.08.03
申请人 RICOH CO LTD 发明人 OTA HIDEKAZU;KIMURA YUJI;KONDO HITOSHI;KAMEYAMA KENJI;YAMADA KATSUYUKI;TAKAHASHI MASAYOSHI
分类号 G02F1/136;G02F1/1365;H01L49/02 主分类号 G02F1/136
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