| 摘要 |
<p>PURPOSE:To eliminate the polarity difference of current-voltage characteristics and the flickering of display so as to improve image quality by forming a conductor layer in contact with the insulating layer of a nonlinear two-terminal element or the constituting layer thereof of the same material. CONSTITUTION:The film of ITO is formed by a method, such as sputtering, on a glass substrate 1 and is wet etched by an etchant of ferric chloride type, by which picture element electrodes 2 are formed. The film of SiO2, Al2O3, etc., to constitute the insulating layer 3 is formed by a method, such as sputtering or CVD method., Finally, an ITO film and an In-Sn film are respectively formed as electrodes 4 for the two-terminal element and scanning electrodes 5. The formation of the ITO film is executed in a reactive sputtering or ion plating device in oxygen plasma, by which the continuous formation of the two films within the same chamber is allowed. Since the two layers 2, 4 holding the insulating layer 3 there between are formed of the same material, the polarity difference of the current-voltage characteristics of the MIM element is eliminated.</p> |
