发明名称 VACUUM CHAMBER
摘要 PURPOSE:To lessen the adhesion of dust to a work, sample, etc., by moving a moving base so as to close an aperture, hermetically closing a vacuum chamber and introducing the work, sample, etc., into the vacuum chamber. CONSTITUTION:The vacuum chamber 30 is provided to face the aperture 29 of a clean tunnel 11. The moving base 32 is provided in the clean tunnel 11 in correspondence to the aperture 29. The work 50, sample, etc., are supplied through the clean tunnel 11 to the moving base 32. The vacuum chamber 30 is hermetically closed when the moving base 32 is so moved as to close the aperture 29. The work 50, sample, etc., are introduced into the vacuum chamber 30 simultaneously therewith. The relatively large work and sample are both easily introduced into the vacuum chamber in this way.
申请公布号 JPH0491885(A) 申请公布日期 1992.03.25
申请号 JP19900206055 申请日期 1990.08.03
申请人 SONY CORP 发明人 TANAKA SADAO
分类号 G03F7/20;B23K15/06;B23K26/12;H01L21/02;H01L21/677;H01L21/68 主分类号 G03F7/20
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