| 摘要 |
PURPOSE:To prevent a jet stream from being whirled when fine frozen particles are jetted and to prevent dust particles from adhering to a semiconductor wafer by providing the following: an evacuation chamber which has an expanded part having a cross- sectional area larger than that of a cleaning tank and which has been connected to the downstream of the cleaning tank; a curved guide plate which guides a jet stream from the cleaning tank to the expanded part in the evacuation chamber; and an evacuation blower which evacuates the inside of the evacuation chamber. CONSTITUTION:Fine frozen particles which have been jetted at a high pressure together with a gas from a jet nozzle 5 are passed through a flow-regulating plate 13; after that, they are guided to guide plates 12 and guided to an evacuation chamber 11 having an expanded part 11a; their flow speed is reduced. At this time, an air current inside a cleaning tank 10 is regulated to a down flow by the action of the flow- regulating plate 13. Since the speed of a jet stream is reduced quickly and its flow is regulated in this manner, it is possible to effectively prevent the jet stream from being whirled upward even when the evacuation amount of an evacuation blower 9 is not large. When the jet stream raised along the inner wall of the cleaning tank 10 is whirled, it hits a stopper 15 and is evacuated from an evacuation port 14 which has been opened at the lower part of the base of the stopper 15. |
