| 摘要 |
<p>A high resolution laminography system (200) for the inspection of integrated circuits wherein a beam of highly focused electrons is traced in a circular pattern on a flat target (272) within a vacuum chamber (275). The target (272) converts the electron beam into X-rays, so that a point source of X-rays is produced which rotates in synchronization with a rotating detector assembly. An object (210) is placed within the vacuum chamber (274), between the X-rays source and the detector so that an X-ray shadowgraph of the object is converted into an optical image by a phosphor screen (285) deposited on the inside of a window that seals the vacuum chamber. The rotating detector assembly derotates the image so as to be viewed and integrated in a stationary video camera (300) as a laminograph. A computer (350) and feedback system (320) controls an automated positioning system which deflects the electron beam so as to image selected regions of the object under inspection. In order to maintain high image quality and resolution, the computer (350) and feedback system (320) also controls the synchronization of the electron beam deflection and the rotating detector system, making adjustments for inaccuracies of the mechanics of the system. The computer system (350) can also operate under program control to automatically analyze data, measure characteristics of the object under inspection, and make decisions regarding the acceptability of the object's quality. The invention also employs scanning electron microscope techniques to directly image the target so that the condition of the target may be monitored, and electron drift within the system can be compensated. The invention is particularly well suited for failure analysis of integrated circuit chips and the like.</p> |
