| 摘要 |
PURPOSE:To avoid positions where an electron beam cannot be applied, and prevent damage of a sample and trouble of a device by providing a means to designate a motion passage of an electron beam, a means to compute a drive quantity for a sample stage and a drive quantity moving means. CONSTITUTION:When an electron beam moves between analysis zones, the electron beam is moved avoiding ranges where there are materials easy to be damaged by the electron beam. For setting a motion passage, a sample S is observed by an optical microscope 1 or the like, an image by the microscope is taken by a TV camera 2, picture signals are displayed in a CRT 3, the motion passage for the electron beam is designated by a mouse or cursor in a picture, and the designated motion passage is read by a computer 6. The electron beam 6 is thus moved along the desired passage to the next analysis zone by the computer 6, thereby damage of the sample is eliminated. |
