发明名称 Insulator for solid state device and its fabrication method.
摘要 <p>To improve the characteristics of oxides and other insulators formed by conventional techniques, particularly to improve its density, relative dielectric constant, resistance to acid, resistance to reduction and other characteristics, and to provide solid state devices or socharacteristics, the surfaces of the silicon oxide isulator, or the like, is irradiated with electrically neutral particles.</p>
申请公布号 EP0475265(A2) 申请公布日期 1992.03.18
申请号 EP19910114941 申请日期 1991.09.04
申请人 HITACHI, LTD. 发明人 MIZUTANI, TATSUMI;YUNOGAMI, TAKASHI;YOKOGAWA, KENETSU;KOBAYASHI, NOBUYOSHI
分类号 H01L21/00;H01L21/3105;H01L21/314;H01L21/316 主分类号 H01L21/00
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