| 摘要 |
<p>A fast atom beam source used e.g. for sputtering, which comprising an ion source (7) that emits an ion beam (3) and an electron gun (2) that emits an electron beam at a speed substantially equal to the speed of the ions in the ion beam emitted from said ion source and in the same direction as that of said ion beam. The fast atom beam source may also include speed control means for control the speed of the electrons (32,33) in the electron beam emitted from said electron gun to a level substantially equal to the speed of the ions in the ion beam, and means for deflection said electron beam (34,41) so that said electron beam is aligned with the direction of said ion beam and then mixed with it.</p> |
